Tokyo, Japan

Ryota Okimoto

This inventor holds 2 USPTO granted patents. Top assignees: Mitsubishi Heavy Industries Limited, Mitsubishi Hitachi Power Systems, Ltd., National Institute for Materials Science. Active years: 2017-2019.


% Patents Active = 100.0

Average Co-Inventor Count = 9.7

ph-index = 1

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2017-2019

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2 patents (USPTO):Explore Patents

Title: The Innovations of Ryota Okimoto

Introduction

Ryota Okimoto is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced alloys and mold production techniques. With a total of two patents to his name, Okimoto's work reflects a commitment to innovation and excellence.

Latest Patents

Okimoto's latest patents include a slurry for forming molds and a Ni-based single crystal superalloy. The slurry for forming a mold consists of a silica sol as a dispersion medium, with niobia-stabilized zirconia dispersed within it. This innovative approach enhances the mold-making process. The Ni-based single crystal superalloy is designed to improve the performance and durability of materials used in high-temperature applications.

Career Highlights

Throughout his career, Ryota Okimoto has worked with prominent organizations such as Mitsubishi Hitachi Power Systems, Ltd. and the National Institute for Materials Science. His experience in these institutions has allowed him to collaborate with leading experts in the field and contribute to groundbreaking research.

Collaborations

Okimoto has had the opportunity to work alongside talented individuals, including Ikuo Okada and Hidetaka Oguma. These collaborations have further enriched his research and development efforts.

Conclusion

Ryota Okimoto's contributions to materials science and his innovative patents demonstrate his expertise and dedication to advancing technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
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