Company Filing History:
Years Active: 2019-2025
Title: The Innovative Contributions of Ryota Nomura
Introduction
Ryota Nomura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of dielectric compositions and electronic components. With a total of 3 patents to his name, Nomura continues to push the boundaries of innovation in his industry.
Latest Patents
Nomura's latest patents include a dielectric composition that contains a main component expressed by {BaSr}TaO, along with a first subcomponent that includes silicon and manganese. The composition is designed to optimize the amount of silicon and manganese in relation to the main component. Another notable patent focuses on providing a dielectric composition with high density, even when fired at relatively low temperatures. This composition includes tantalum and at least one of barium or strontium, with subcomponents selected from vanadium, titanium, and aluminum.
Career Highlights
Nomura is currently employed at TDK Corporation, where he applies his expertise in materials science to develop innovative electronic components. His work has been instrumental in advancing the technology used in various electronic devices.
Collaborations
Throughout his career, Nomura has collaborated with talented individuals such as Hiroki Akiba and Tetsuhiro Takahashi. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Ryota Nomura's contributions to the field of dielectric compositions and electronic components highlight his innovative spirit and dedication to advancing technology. His work at TDK Corporation and his collaborations with esteemed colleagues further emphasize his impact on the industry.