Ryota Mae

Title: Ryota Mae: Innovator in Polishing Technologies

Introduction

Ryota Mae is a prominent inventor based in Kiyosu, Japan. He has made significant contributions to the field of polishing technologies, particularly in the semiconductor industry. With a total of 3 patents to his name, Mae continues to push the boundaries of innovation.

Latest Patents

Mae's latest patents include a polishing composition, a polishing method, and a method of producing a semiconductor substrate. The polishing composition he developed contains abrasive grains, a basic inorganic compound, an anionic water-soluble polymer, and a dispersing medium. Notably, the zeta potential of the abrasive grains is negative, and the aspect ratio is 1.1 or less. The particle size distribution of the abrasive grains is carefully controlled, ensuring a ratio D90/D50 of more than 1.3. The basic inorganic compound used is an alkali metal salt. Additionally, his method of producing anionically modified colloidal silica is designed to polish silicon nitride films at high speeds while suppressing the polishing speed of silicon oxide films. This method involves ion exchanging raw colloidal silica using an ion exchange resin and subsequently modifying it to obtain anionically modified colloidal silica.

Career Highlights

Mae is currently employed at Fujimi Incorporated, where he applies his expertise in polishing technologies. His work has been instrumental in advancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Some of his notable coworkers include Tsutomu Yoshino and Shogo Onishi, who contribute to the innovative environment at Fujimi Incorporated.

Conclusion

Ryota Mae's contributions to polishing technologies have established him as a key figure in the semiconductor industry. His innovative patents reflect his commitment to enhancing manufacturing processes and improving product quality.