Yokohama, Japan

Ryota Fujisuka


Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Ryota Fujisuka in Semiconductor Technology

Introduction

Ryota Fujisuka, a prominent inventor based in Yokohama, Japan, has made significant strides in the field of semiconductor technology. With a focus on enhancing the performance and efficiency of semiconductor devices, Fujisuka holds one patent that showcases his expertise and innovative spirit.

Latest Patents

Fujisuka's notable patent is for a semiconductor device that encompasses a semiconductor substrate and isolation insulating film. This device features nonvolatile memory cells, each comprising a tunnel insulating film, a floating gate (FG) electrode, a control gate (CG) electrode, and an interelectrode insulating film. The innovation lies in the design of the interelectrode insulating film, which is strategically provided on the side wall of the floating gate electrode. The thickness of this insulating film increases from the upper portion towards the lower portion of the side wall. Furthermore, the patent highlights variations in the thickness of a second insulating film at the upper corner of the FG electrode, adding to the device's advanced functionality.

Career Highlights

Ryota Fujisuka is affiliated with Kabushiki Kaisha Toshiba, a leading company in the electronics sector known for its cutting-edge technology and innovative solutions. His involvement in the organization has enabled him to contribute to various projects aimed at advancing semiconductor technologies. His work reflects the commitment to quality and excellence that Toshiba embodies in its endeavors.

Collaborations

Throughout his career at Toshiba, Fujisuka has collaborated with notable coworkers, including Akihito Yamamoto and Masayuki Tanaka. These partnerships have allowed him to enhance his ideas and apply collective expertise to foster innovative solutions in the semiconductor field.

Conclusion

Ryota Fujisuka's contributions to semiconductor technology are marked by his innovative patent and collaborative spirit. His work at Kabushiki Kaisha Toshiba exemplifies the potential of dedicated inventors in shaping the future of technology. As advancements in semiconductor devices continue to evolve, Fujisuka's contributions will undoubtedly play a pivotal role in this progress.

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