Annaka, Japan

Ryosuke Yoshii

USPTO Granted Patents = 3 

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2019-2024

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Ryosuke Yoshii

Introduction

Ryosuke Yoshii is a prominent inventor based in Annaka, Japan. He has made significant contributions to the field of photocurable compositions and photocatalyst laminates. With a total of 3 patents to his name, Yoshii continues to push the boundaries of innovation in his industry.

Latest Patents

Yoshii's latest patents include a photocurable composition and a photocatalyst laminate. The photocurable composition features a unique blend of components, including a monomer with a (meth)acryloyl structure, a crosslinking agent, an inorganic ultraviolet-blocking agent, and a photopolymerization initiator. This innovative formulation allows for a hydrophilic monomer content of 70% by weight or more, enhancing its application potential. The photocatalyst laminate consists of an undercoat layer and a photocatalyst layer, designed to maintain its photocatalytic function even under prolonged outdoor exposure. This technology ensures excellent weather resistance, making it suitable for various coated articles.

Career Highlights

Yoshii is currently employed at Shin-Etsu Chemical Co., Ltd., where he applies his expertise in materials science to develop cutting-edge products. His work has garnered attention for its practical applications and innovative approaches to solving complex problems in the field.

Collaborations

Throughout his career, Yoshii has collaborated with notable colleagues, including Kohei Masuda and Mamoru Hagiwara. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Ryosuke Yoshii's contributions to the field of photocurable compositions and photocatalyst laminates highlight his innovative spirit and dedication to advancing technology. His work continues to inspire future developments in materials science.

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