Toyama, Japan

Ryosuke Yoshida

USPTO Granted Patents = 3 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2020-2026

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3 patents (USPTO):Explore Patents

Title: Ryosuke Yoshida: Innovator in Semiconductor Technology

Introduction

Ryosuke Yoshida is a prominent inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor technology, holding 3 patents that showcase his innovative approach to substrate processing.

Latest Patents

Yoshida's latest patents include a substrate processing apparatus and methods for manufacturing semiconductor devices. These inventions focus on improving the controllability of film thickness on large surface area substrates. His techniques enhance thickness uniformity between films formed on multiple large substrates, even when batch-processed in a furnace. This advancement reduces the influence of substrate surface area and loading effects, which is crucial for efficient semiconductor manufacturing.

Career Highlights

Yoshida is currently employed at Kokusai Electric Corporation, where he continues to develop cutting-edge technologies in semiconductor processing. His work has been instrumental in advancing the capabilities of semiconductor devices, making them more efficient and reliable.

Collaborations

Yoshida collaborates with Yukinao Kaga, a fellow innovator in the field. Together, they work on projects that push the boundaries of semiconductor technology and improve manufacturing processes.

Conclusion

Ryosuke Yoshida's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the future of semiconductor manufacturing.

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