Ryosuke Matsuno

Title: Ryosuke Matsuno: Innovator in Conductive Materials and Dielectric Films

Introduction

Ryosuke Matsuno is a prominent inventor based in Saga-ken, Japan. He has made significant contributions to the field of materials science, particularly in the development of conductive materials and dielectric films. With a total of 4 patents to his name, Matsuno's work showcases innovative approaches to enhancing material properties.

Latest Patents

Matsuno's latest patents include a conductive material that incorporates metal nanowires and an extensible copolymer with an N—C≡O structure. This unique combination results in a conductive material that exhibits excellent elongation properties while maintaining stable electrical resistance even when stretched. Additionally, he has developed a method for producing this conductive material, which involves several steps, including the polymerization of monomers and the growth of metal nanowires in a controlled manner.

Another notable patent is for a dielectric film that consists of an elastomer and nanoparticles chemically bound to it. These nanoparticles, which contain cyano groups, are produced through a sol-gel process using an organometallic compound. The manufacturing method for this dielectric film includes creating a chelate compound, producing a sol of metallic oxide particles, and applying the mixed solution to a substrate for curing.

Career Highlights

Throughout his career, Matsuno has worked with reputable organizations such as Sumitomo Riko Company Limited and Kyushu University. His experience in these institutions has allowed him to refine his expertise in material science and contribute to various innovative projects.

Collaborations

Matsuno has collaborated with notable colleagues, including Atsushi Takahara and Yota Kokubo. These partnerships have further enriched his research and development efforts in the field of conductive materials and dielectric films.

Conclusion

Ryosuke Matsuno is a distinguished inventor whose work in conductive materials and dielectric films has made a significant impact in materials science. His innovative patents and collaborations highlight his commitment to advancing technology in this field.