This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 1994.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1994
Title: Ryoko Yamanaka: Inventor in Projection Exposure Technology.
Introduction
Ryoko Yamanaka is an inventor associated with Hitachi, Ltd., in Kokubunji, Japan. Her recorded patent work concerns projection exposure technology for forming fine patterns.
Latest Patents
The available information lists one patent for Yamanaka: “Projection Exposure Apparatus and Pattern Forming Method for Use.” The invention describes an apparatus with an effective light source, a mask, a projection lens, and an optical filter positioned near the lens’s pupil plane. The filter reduces transmittance in a region inside the periphery of an annular region corresponding to the source’s illumination distribution. This arrangement is designed to form patterns at or below the wavelength of the light used while maintaining strong contrast and a deep focus range. Yamanaka is credited with 1 patent in the supplied data.
Career Highlights
Yamanaka’s listed invention addresses a key challenge in optical pattern formation: producing very small features while preserving image contrast and focus tolerance. The supplied information associates her work with Hitachi, Ltd., and identifies Kokubunji as her location.
Collaborations
The supplied data names Hiroshi Fukuda and Tsutomu Tawa as Yamanaka’s coworkers. It does not specify their roles in the patent or describe particular collaborative projects.
Conclusion
Ryoko Yamanaka’s recorded patent highlights an optical approach to forming fine patterns with improved contrast and focus performance.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile