Ryoken Ozawa

Title: The Innovations of Ryoken Ozawa

Introduction

Ryoken Ozawa is a notable inventor based in Joetsu, Japan. He has made significant contributions to the field of photomask technology, which is essential in the semiconductor manufacturing process. His innovative work has led to the development of a unique photomask blank that enhances the efficiency and effectiveness of photolithography.

Latest Patents

Ozawa holds a patent for a photomask blank and photomask designed for exposure light of ArF excimer laser. This invention includes a transparent substrate and a light-shielding film composed of molybdenum, silicon, and nitrogen. The light-shielding film can be formed in either a single layer or a multilayer configuration. It is designed to maintain a reflectance of 40% or less on the side remote from the substrate. Furthermore, the refractive indexes at the surfaces on both sides of all layers exhibit a minimal difference of 0.2 or less, while the extinction coefficients show a difference of 0.5 or less. This innovative design ensures that the light-shielding film maintains a satisfactory and undeteriorated sectional shape of a mask pattern during the etching process in mask processing or defect correction.

Career Highlights

Ozawa is currently employed at Shin-Etsu Chemical Co., Ltd., where he continues to push the boundaries of innovation in photomask technology. His work has been instrumental in advancing the capabilities of photomasks used in the semiconductor industry.

Collaborations

Throughout his career, Ozawa has collaborated with talented individuals such as Takuro Kosaka and Yukio Inazuki. These collaborations have fostered an environment of innovation and creativity, leading to significant advancements in their field.

Conclusion

Ryoken Ozawa's contributions to photomask technology exemplify the spirit of innovation in the semiconductor industry. His patented inventions and collaborative efforts continue to influence the development of advanced manufacturing processes.