Company Filing History:
Years Active: 2000
Title: Ryoji Higuchi: Innovator in Substrate Washing Technology
Introduction
Ryoji Higuchi is a notable inventor based in Kumamoto, Japan. He has made significant contributions to the field of substrate washing technology. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of washing substrates.
Latest Patents
Higuchi holds a patent for an "Apparatus and method for washing substrate." This invention includes a spin chuck for holding and rotating a substrate, a washing brush mechanism for applying a washing liquid, and a control device that adjusts the physical force acting on contaminants based on their state. This technology is crucial for maintaining the cleanliness of substrates in various applications.
Career Highlights
Ryoji Higuchi is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. His work has been instrumental in advancing substrate washing techniques, which are vital for the production of high-quality electronic components.
Collaborations
Higuchi has collaborated with notable colleagues such as Minoru Kubota and Kenichi Miyamoto. Their combined expertise has contributed to the success of various projects within the company.
Conclusion
Ryoji Higuchi's innovative contributions to substrate washing technology exemplify the impact of dedicated inventors in the field of electronics. His patent and work at Tokyo Electron Limited highlight the importance of continuous innovation in maintaining industry standards.