Company Filing History:
Years Active: 2024
Title: Ryoji Asakura: Innovator in Plasma Processing Technology
Introduction
Ryoji Asakura is a prominent inventor based in Hillsboro, Oregon, known for his significant contributions to plasma processing technology. With a total of three patents to his name, Asakura has made strides in enhancing the accuracy and efficiency of semiconductor manufacturing processes.
Latest Patents
Asakura's latest patents include a plasma processing apparatus and a plasma processing method. The plasma processing method focuses on detecting and processing the thickness of the processing target film with high accuracy, even when the fine shape of the semiconductor wafer surface varies. This method involves detecting the state of the processing target film within a vacuum processing chamber, monitoring light emission from the plasma, and calculating an estimated value of the film thickness based on differential waveform data. The plasma processing apparatus complements this method by incorporating a processing unit that detects the thickness of the target film on a wafer or identifies the end point during processing using light from the wafer.
Career Highlights
Ryoji Asakura is currently employed at Hitachi High-Tech Corporation, where he continues to innovate in the field of plasma processing. His work has been instrumental in advancing technologies that are critical to the semiconductor industry.
Collaborations
Asakura collaborates with talented coworkers, including Tsubasa Okamoto and Soichiro Eto, who contribute to the development of cutting-edge technologies in their field.
Conclusion
Ryoji Asakura's innovative work in plasma processing technology has made a significant impact on the semiconductor industry. His patents reflect a commitment to improving manufacturing processes and enhancing the accuracy of film thickness detection.