Location History:
- Chiba, JP (2019)
- Tokyo, JP (2021 - 2023)
Company Filing History:
Years Active: 2019-2023
Title: Ryohei Tansho: Innovator in Charged Particle Irradiation Technology
Introduction
Ryohei Tansho is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of charged particle irradiation technology. With a total of 5 patents to his name, Tansho continues to push the boundaries of innovation in medical and industrial applications.
Latest Patents
One of Tansho's latest inventions is a charged particle irradiation apparatus. This apparatus includes a collimator apparatus that is provided in an irradiation nozzle, which emits a charged particle beam to an irradiation target. The collimator control unit is responsible for managing the collimator apparatus. The collimator mechanism features one or more arm-shaped collimators that extend from a base part, along with a drive mechanism that moves the collimator mechanism on a plane perpendicular to the traveling direction of the charged particle beam. The arm-shaped collimator consists of one or more movable leaves that can rotate independently on the perpendicular plane. By adjusting the collimator mechanism and/or rotating the movable leaves, the arm-shaped collimators can be arranged to align with the edge of the irradiation target, effectively blocking any charged particle beam that would otherwise irradiate outside the target area.
Career Highlights
Ryohei Tansho is currently associated with B Dot Medical Inc., where he applies his expertise in developing advanced medical technologies. His work has been instrumental in enhancing the precision and effectiveness of charged particle therapies.
Collaborations
Tansho collaborates with notable colleagues such as Takuji Furukawa and Yousuke Hara, contributing to a dynamic team focused on innovation in medical technology.
Conclusion
Ryohei Tansho's contributions to charged particle irradiation technology exemplify his commitment to advancing medical applications. His innovative patents and collaborative efforts continue to shape the future of this critical field.
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