Company Filing History:
Years Active: 2020-2025
Title: Ryohei Hokaku: Innovator in Substrate Cleaning Technology
Introduction
Ryohei Hokaku is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate cleaning technology, holding two patents that showcase his innovative approach to improving cleaning processes.
Latest Patents
Hokaku's latest patents include a substrate cleaning device and a substrate processing method. The substrate cleaning device features a substrate holder that securely holds a substrate, along with a movable cleaning brush designed to clean the substrate effectively. This device also incorporates a remover that transfers liquid to facilitate the cleaning process. The innovative design allows for efficient cleaning by ensuring that liquid adhering to the cleaning surface is effectively removed before the actual cleaning occurs. His substrate processing method involves rotating the substrate while a brush moves along its surface, utilizing a spray nozzle to generate droplets that enhance the cleaning process.
Career Highlights
Hokaku has established himself as a key figure in the substrate cleaning industry through his work at Screen Holdings Co., Ltd. His inventions have contributed to advancements in cleaning technology, making processes more efficient and effective.
Collaborations
Hokaku has collaborated with notable coworkers, including Junichi Ishii and Takashi Shinohara, who have also contributed to the development of innovative technologies in their respective fields.
Conclusion
Ryohei Hokaku's contributions to substrate cleaning technology through his patents reflect his commitment to innovation and excellence. His work continues to influence the industry and improve cleaning processes worldwide.