Screen Holdings Co., Ltd.

Ryohei Hokaku

Takashi Shinohara

Junichi Ishii

Shotaro Tsuda

A substrate cleaning device includes a substrate holder that holds a substrate, a cleaning brush that is provided to be movable between a cleaning position for cleaning the substrate held by the substrate holder and a waiting position outward of the substrate held by the substrate holder, and has a cleaning surface capable of cleaning the substrate held by the substrate holder, a remover that is configured such that liquid is transferrable to the remover, and a driver that moves at least one of the cleaning brush and the remover with respect to another one such that at least part of liquid adhering to the cleaning surface is transferred to the remover when the cleaning surface and the remover come close to each other at a position outward of a position above the substrate held by the substrate holder, before the substrate is cleaned by the cleaning brush.

Substrate cleaning device and substrate cleaning method

While a substrate is being rotated, the lower surface of a brush is moved along the upper surface of the substrate. The brush and a spray nozzle are moved upward from a takeoff position to a lower non-contact position so as to separate the lower surface of the brush from the upper surface of the substrate. The spray nozzle generates the droplets in a state where the brush and the spray nozzle are located in the lower non-contact position so as to make the droplets collide with the upper surface of the substrate, and then the droplets colliding with the upper surface of the substrate are discharged from a gap between the lower surface of the brush and the upper surface of the substrate while the droplets are being supplied to the lower surface of the brush.

Growing community of inventors

Kyoto, Japan

Ryohei Hokaku