Hitachi, Japan

Ryoei Katsura

This inventor holds 1 USPTO granted patent. Top assignees: Hitachi Engineering Co., Ltd., Hitachi, Ltd.. Active years: 1986.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryoei Katsura. Retrieved from https://idiyas.com/inventor/ryoei-katsura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1986

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Ryoei Katsura: Innovator in Gas Measurement Technology

Introduction

Ryoei Katsura is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of gas measurement technology, particularly in the quantitative determination of dissolved gas concentrations in water.

Latest Patents

Katsura holds a patent for a "Method and apparatus for measuring dissolved gas concentrations." This innovative technology allows for the simultaneous measurement of two dissolved gas components, such as oxygen and hydrogen, in a single membrane-type oxygen meter. The method utilizes a membrane that creates an overlapped potential region, enabling accurate measurements of gas concentrations through the application of specific potentials to electrodes.

Career Highlights

Throughout his career, Ryoei Katsura has worked with prominent companies, including Hitachi, Ltd. and Hitachi Engineering Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas in gas measurement technology.

Collaborations

Katsura has collaborated with esteemed colleagues, including Masao Kitamura and Norio Nakayama. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Ryoei Katsura's work in measuring dissolved gas concentrations has made a significant impact in the field of environmental monitoring and analysis. His innovative approach continues to influence advancements in gas measurement technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…