Chuo-ku, Japan

Ryo Tanaka

This inventor holds 1 USPTO granted patent. Top assignee: Nichias Corporation. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryo Tanaka. Retrieved from https://idiyas.com/inventor/ryo-tanaka-v14lx1o1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Ryo Tanaka: Innovator in Disk Roll Technology

Introduction

Ryo Tanaka is a prominent inventor based in Chuo-ku, Japan. He has made significant contributions to the field of materials science, particularly in the development of base materials for disk rolls. His innovative approach has led to advancements that enhance the performance and durability of these materials.

Latest Patents

Ryo Tanaka holds a patent for a base material for a disk roll, which includes a production method for the disk roll itself. This patent describes a base material that contains a layered silicate, which is composed of two or more kinds of minerals with an interlayer distance exceeding 10 angstroms. The resulting material exhibits excellent compressive strength and wear resistance, making it highly effective for its intended applications. He has 1 patent to his name.

Career Highlights

Tanaka is currently employed at Nichias Corporation, where he continues to work on innovative materials and technologies. His role at the company allows him to collaborate with other experts in the field, further enhancing his contributions to materials science.

Collaborations

Some of Ryo Tanaka's notable coworkers include Shigeru Nakama and Kazuhisa Watanabe. Their collaborative efforts contribute to the ongoing research and development initiatives at Nichias Corporation.

Conclusion

Ryo Tanaka's work in developing advanced materials for disk rolls showcases his innovative spirit and dedication to improving technology. His contributions are vital to the industry, and his patent reflects the potential for enhanced performance in material applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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