This inventor holds 1 USPTO granted patent. Top assignee: Cataler Corporation. Active years: 2022.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2022
Title: Ryo Nishimura: Innovator in Exhaust Gas Purification Technology
Introduction
Ryo Nishimura is a notable inventor based in Kakegawa, Japan. He has made significant contributions to the field of exhaust gas purification technology. His innovative approach has led to the development of a unique manufacturing method that enhances the efficiency of exhaust gas purification devices.
Latest Patents
Ryo Nishimura holds a patent for a manufacturing method for an exhaust gas purification device. The purpose of this invention is to provide a method that can uniformly coat a honeycomb substrate with slurry, even when using a low viscosity slurry. The patent details a process that includes providing a slurry for catalyst layer formation from a shower nozzle onto a honeycomb substrate, coating the substrate, and firing it. The viscosity of the slurry is specified to be 800 mPa·s or less at a shear rate of 4. The design of the shower nozzle includes multiple discharge openings, ensuring optimal coating of the substrate.
Career Highlights
Ryo Nishimura is associated with Cataler Corporation, where he has been instrumental in advancing technologies related to exhaust gas purification. His work has not only contributed to the company's portfolio but has also had a positive impact on environmental sustainability.
Collaborations
Ryo has collaborated with talented coworkers such as Yuki Tanaka and Shoko Fukuyo. Their combined efforts have fostered innovation and development within their projects.
Conclusion
Ryo Nishimura's contributions to exhaust gas purification technology exemplify the importance of innovation in addressing environmental challenges. His patent reflects a commitment to improving manufacturing processes and enhancing the effectiveness of purification devices.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
