Company Filing History:
Years Active: 2024
Title: Ryo Matsuhashi - Innovator in Film Deposition Technology
Introduction
Ryo Matsuhashi is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of film deposition technology, particularly through his innovative patent that addresses challenges in film formation.
Latest Patents
Matsuhashi holds a patent for a film formation apparatus designed to reduce hillock formation while ensuring a uniform film thickness distribution. This apparatus includes a chamber, a rotary table that circulates and carries a workpiece along a circumferential transfer path, multiple targets containing film deposition material positioned at varying radial distances, a shield member that forms a film deposition chamber, and a plasma generator that introduces sputter gas and generates plasma within the chamber. His invention enhances the efficiency and quality of film deposition processes.
Career Highlights
Ryo Matsuhashi is associated with Shibaura Mechatronics Corporation, where he applies his expertise in developing advanced technologies. His work has been instrumental in improving manufacturing processes and product quality in the field of mechatronics.
Collaborations
Matsuhashi collaborates with talented colleagues, including Shohei Tanabe and Koji Yoshimura, who contribute to the innovative environment at Shibaura Mechatronics Corporation.
Conclusion
Ryo Matsuhashi's contributions to film deposition technology exemplify the impact of innovation in engineering. His patent reflects a commitment to advancing manufacturing techniques and improving product outcomes.