Company Filing History:
Years Active: 1997-1998
Title: Ryo Ishiyama: Innovator in Ultrasonic Flaw Detection Technology
Introduction
Ryo Ishiyama is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of ultrasonic flaw detection technology. With a total of 2 patents to his name, Ishiyama's work focuses on enhancing the accuracy and efficiency of flaw detection in various materials.
Latest Patents
Ishiyama's latest patents include innovative apparatuses that utilize ultrasonic waves for flaw detection. The first patent describes a flaw detection apparatus employing tire probes that measure the thickness of a test object or the position of a cavity within it. This apparatus employs a pair of ultrasonic probes, and by adjusting the relative position of one probe to the other, multiple waveform data of ultrasonic reception signals are acquired. The addition of these waveform data minimizes the surface wave component's level, which is affected by the difference in arrival times.
The second patent also focuses on a flaw detection apparatus using ultrasonic waves. Similar to the first, it measures the thickness of a test object or the position of a cavity inside it. By changing the relative position of the ultrasonic probes, a plurality of waveform data is collected and added per corresponding unit of time. This method effectively offsets the surface wave component's level, enhancing the accuracy of flaw detection.
Career Highlights
Ryo Ishiyama is currently employed at Tokimec Inc., where he continues to develop and refine his innovative technologies. His work has positioned him as a key figure in the field of ultrasonic flaw detection.
Collaborations
Ishiyama collaborates with notable colleagues, including Shinichi Takeuchi and Yutaka Kashiwase. Their combined expertise contributes to the advancement of ultrasonic technology and its applications.
Conclusion
Ryo Ishiyama's contributions to ultrasonic flaw detection technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in flaw detection, making significant strides in the field.