Cambridge, MA, United States of America

Ryan Roelke

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Micro Focus Lcc. Active years: 2021.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Innovations of Ryan Roelke

Introduction

Ryan Roelke is an accomplished inventor based in Cambridge, MA (US). He has made significant contributions to the field of database management systems. His innovative approach has led to the development of a unique patent that enhances the efficiency of metadata transfer processes.

Latest Patents

Ryan Roelke holds a patent for a "Parallel batch metadata transfer update process within sharded columnar database system." This invention involves a database management system that utilizes a cluster of nodes, where a columnar database is sharded into various shards. The source nodes maintain up-to-date metadata objects, while the target nodes store out-of-date metadata objects. A coordinator node initiates a parallel batch update process, ensuring that the out-of-date metadata at the target nodes is updated in parallel from the source nodes. This innovative method allows for efficient data management and synchronization across the database system.

Career Highlights

Ryan is currently employed at Micro Focus LLC, where he continues to work on advancing database technologies. His expertise in this area has positioned him as a valuable asset to his team and the company.

Collaborations

Ryan collaborates with talented coworkers, including Styliani Pantela and Shreya Prasad. Their combined efforts contribute to the innovative projects at Micro Focus LLC.

Conclusion

Ryan Roelke's contributions to database management systems through his patent demonstrate his commitment to innovation and efficiency in technology. His work continues to influence the field positively.

Profile summary based on public USPTO records.
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