Thornton, CO, United States of America

Ryan Dwyer

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Insulation Technology Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryan Dwyer. Retrieved from https://idiyas.com/inventor/ryan-dwyer-wylmx1c6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Ryan Dwyer: Innovator in Pipe Testing Technology

Introduction

Ryan Dwyer is an accomplished inventor based in Thornton, Colorado. He has made significant contributions to the field of engineering, particularly in the area of testing the roundness of pipes and hollow cylinders. His innovative approach has led to the development of a unique instrument that enhances the accuracy of such measurements.

Latest Patents

Ryan Dwyer holds a patent for an "Instrument for testing the roundness of the inner wall of a pipe or other hollow cylinder." This invention is crucial for industries that rely on precise measurements for quality control and manufacturing processes. His patent portfolio includes 1 patent that showcases his expertise and commitment to innovation.

Career Highlights

Dwyer is currently employed at Insulation Technology Corporation, where he applies his skills and knowledge to further advancements in technology. His work at the company has positioned him as a key player in the development of innovative solutions for the industry.

Collaborations

Ryan has collaborated with notable coworkers such as Shawn Hurla and Ray Lavallee. Their combined expertise fosters a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Ryan Dwyer exemplifies the spirit of innovation through his contributions to pipe testing technology. His dedication to improving measurement accuracy has made a lasting impact in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…