This inventor holds 3 USPTO granted patents and 3 published patent applications and 3 EPO patents. Top assignee: Basf Se Corporation. Active years: 2020-2023.
Location History:
- Ludwigshafen, DE (2020 - 2022)
- Ludwigshafen am Rhein, DE (2023)
Company Filing History:
Years Active: 2020-2023
Title: Ruth Lohwasser: Innovator in Polyamide and Thioether Processes
Introduction
Ruth Lohwasser is a prominent inventor based in Ludwigshafen, Germany. She has made significant contributions to the field of materials science, particularly in the development of processes involving polyamides and thioethers. With a total of three patents to her name, Lohwasser's work has had a notable impact on various industrial applications.
Latest Patents
One of Lohwasser's latest patents focuses on the production of molded bodies through selective laser sintering. This innovative method utilizes a sinter powder that contains at least one polyamide and a specific range of aluminum silicate. The patent emphasizes the importance of achieving a particular size distribution, with a D50 value between 2.5 to 4.5 micrometers. Another significant patent involves a process for producing a mono vinyl thioether by reacting acetylene with a thiol-hydroxy compound under low pressure conditions.
Career Highlights
Lohwasser is currently associated with BASF SE Corporation, a leading chemical company known for its innovative solutions. Her work at BASF has allowed her to explore and develop new materials and processes that enhance product performance and sustainability.
Collaborations
Throughout her career, Lohwasser has collaborated with esteemed colleagues such as Claus Gabriel and Rainer Ostermann. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Ruth Lohwasser's contributions to the fields of polyamide and thioether processes exemplify her dedication to innovation and excellence. Her patents reflect a commitment to advancing materials science and improving industrial applications.