This inventor holds 1 USPTO granted patent. Top assignee: General Electric Company. Active years: 1996.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1996
Title: Russell L Wilt: Innovator in Silane Mixtures
Introduction
Russell L Wilt is a notable inventor based in Clifton Park, NY (US). He has made significant contributions to the field of chemical engineering, particularly in the development of silane mixtures. His innovative work has led to the creation of a patented process that enhances the efficiency of silicone curing.
Latest Patents
Russell L Wilt holds a patent for a "Process for preparing a mixture of alkoxyacyloxy silane." This patent describes a continuous method for producing a mixture of alkylpolyacyloxysilane and alkoxyacyloxysilane, which serves as a curing catalyst for one-part moisture-curable silicone RTV. The process involves establishing a steady-state mixture in a distillation system, which includes a reboiler, a distillation column, and a condenser. The continuous introduction of an alkyltrichlorosilane and silicon tetrachloride, along with the direct feeding of an alcohol such as tertiary butanol, facilitates the production of the desired silane mixture.
Career Highlights
Russell L Wilt is associated with General Electric Company, where he has applied his expertise in chemical processes. His work has contributed to advancements in silicone technology, making significant impacts in various applications.
Collaborations
Throughout his career, Russell has collaborated with esteemed colleagues, including Luisito A Tolentino and Lewis O Slocum. These collaborations have fostered innovation and have been instrumental in the development of new technologies.
Conclusion
Russell L Wilt's contributions to the field of chemical engineering, particularly through his patented processes, highlight his role as an innovator in silane mixtures. His work continues to influence the industry and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
