Merrimack, NH, United States of America

Russell Anderson

This inventor holds 1 USPTO granted patent. Top assignee: Raytheon Company. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Russell Anderson. Retrieved from https://idiyas.com/inventor/russell-anderson-1p8uuck6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Russell Anderson: Innovator in Additive Manufacturing

Introduction

Russell Anderson is a notable inventor based in Merrimack, NH (US). He has made significant contributions to the field of additive manufacturing, particularly in the development of innovative connectors.

Latest Patents

Anderson holds a patent for an "Additively manufactured cluster connector." This invention describes an apparatus and method for a cluster connector that includes at least three coaxial-cable core conductors, each formed through an additive manufacturing process. The design features a dielectric around each conductor, a metallic shield surrounding each dielectric, and at least one stub on each metallic shield. Additionally, a common ground connection is integrated into the design, enhancing the functionality of the connector.

Career Highlights

Russell Anderson is currently employed at Raytheon Company, where he applies his expertise in engineering and innovation. His work focuses on advancing technologies that improve connectivity and performance in various applications.

Collaborations

Anderson collaborates with talented professionals, including Mary K. Herndon and Nahid Rahman, who contribute to the innovative environment at Raytheon Company.

Conclusion

Russell Anderson's work in additive manufacturing exemplifies the spirit of innovation in engineering. His patent for the cluster connector showcases his commitment to advancing technology in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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