Akron, OH, United States of America

Ruslan Burtovyy

USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):

Title: Innovations of Ruslan Burtovyy in Optical Materials

Introduction

Ruslan Burtovyy is an accomplished inventor based in Akron, OH (US). He has made significant contributions to the field of optical materials, particularly through his innovative patent. His work focuses on enhancing the properties and applications of polycycloolefin compositions.

Latest Patents

Ruslan Burtovyy holds a patent for "Hindered amine stabilized UV active organopalladium catalyzed polycycloolefin compositions as optical materials." This invention encompasses compositions that include an organopalladium compound, a photoacid generator, a photosensitizer, olefinic monomers, and a stabilizer, such as a hindered amine. These compositions undergo vinyl addition polymerization when exposed to suitable actinic radiation, resulting in a substantially transparent film. The stability of these compositions at room temperature for several days to months, as well as their ability to be stored at higher temperatures, makes them versatile for various applications. They can be tailored to form films with different opto-electronic properties, making them useful in coatings, encapsulants, fillers, leveling agents, sealants, and adhesives.

Career Highlights

Ruslan Burtovyy is associated with Promerus, LLC, where he continues to develop innovative solutions in the field of optical materials. His work has contributed to advancements in the industry, showcasing his expertise and commitment to innovation.

Collaborations

Ruslan has collaborated with notable coworkers, including Shun Hayakawa and Guodong Deng. These collaborations have further enriched his research and development efforts.

Conclusion

Ruslan Burtovyy's contributions to the field of optical materials through his innovative patent demonstrate his expertise and dedication to advancing technology. His work continues to impact various applications, showcasing the importance of innovation in this field.

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