Rupali Kedar Kulkarni

Title: Innovations by Rupali Kedar Kulkarni

Introduction

Rupali Kedar Kulkarni is a prominent inventor based in Maharashtra, India. She has made significant contributions to the field of data management and security through her innovative patents. With a total of 7 patents, her work focuses on enhancing the efficiency and security of data processing systems.

Latest Patents

One of her latest patents is titled "Method and system for finding one or more unique entities in data." This invention addresses the challenges of identifying unique key fields in structured data, which is crucial for effective data management. The method allows for the discovery of unique entities with high accuracy while minimizing the time and cost involved. It is designed to be scalable, accommodating increasing volumes of data and fields, and features a multi-phase analysis process that optimizes performance.

Another notable patent is "System and method for at-source masking of sensitive data." This invention provides a solution for data masking directly at the source, ensuring that sensitive information is protected. The method involves reading a production database, identifying unique identifiers, and creating a temporary table for masked data. This approach not only secures sensitive information but also updates the production database efficiently.

Career Highlights

Rupali Kedar Kulkarni is currently employed at Tata Consultancy Services Limited, where she applies her expertise in data management and security. Her innovative contributions have positioned her as a key figure in her field, and her patents reflect her commitment to advancing technology.

Collaborations

Rupali has collaborated with notable colleagues such as Ashim Roy and Nikhil Girish Patwardhan. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Rupali Kedar Kulkarni's work exemplifies the impact of innovation in data management and security. Her patents not only address critical challenges in the industry but also pave the way for future advancements. Her contributions continue to influence the field positively.