Kolbotn, Norway

Rune Kaald

This inventor holds 1 USPTO granted patent. Top assignee: Omnivision Technologies, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rune Kaald. Retrieved from https://idiyas.com/inventor/rune-kaald-4dt101vh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Rune Kaald

Introduction

Rune Kaald is a notable inventor based in Kolbotn, Norway. He has made significant contributions to the field of technology, particularly in the area of anti-lag methods for electronic devices. His innovative approach has led to the development of a unique patent that enhances the performance of lateral overflow integration capacitors.

Latest Patents

Rune Kaald holds a patent for the LOFIC anti-lag methods with reverse bias optimization. This patent, titled "Lateral overflow integration capacitor (LOFIC) anti-lag methods with reverse bias optimization," outlines a method that involves applying a reverse bias to a LOFIC during idle periods. The method includes specific steps such as coupling metal electrodes to power and bias voltage sources, which optimizes the performance of the pixel LOFIC.

Career Highlights

Rune Kaald is currently employed at Omnivision Technologies, Inc., where he continues to innovate and develop new technologies. His work focuses on improving electronic systems and devices, making them more efficient and effective in their operations. With a patent portfolio that includes 1 patent, he has established himself as a key player in his field.

Collaborations

Some of Rune's coworkers include Lei Zou and Sindre Mikkelsen. Their collaborative efforts contribute to the advancement of technology at Omnivision Technologies, Inc.

Conclusion

Rune Kaald's contributions to the field of technology through his innovative patent demonstrate his commitment to enhancing electronic systems. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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