San Francisco, CA, United States of America

Rune Dahl

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Silicon Graphics, Incorporated. Active years: 2000.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Rune Dahl

Introduction

Rune Dahl is a notable inventor based in San Francisco, CA. He has made significant contributions to the field of programming through his innovative patent. His work focuses on enhancing the efficiency of code execution, which is crucial in today's fast-paced technological landscape.

Latest Patents

Rune Dahl holds a patent for a "Method and apparatus for extraction of program region." This invention provides a method for marking a region of source code within a program unit and extracting an executable version of this marked region. The extracted executable version maintains an initialized program state equivalent to that of the original source code when it entered the region. This method effectively removes unnecessary source code while retaining enough to ensure that the extracted region executes identically to the original program context.

Career Highlights

Rune Dahl is currently employed at Silicon Graphics, Incorporated, where he continues to innovate and contribute to the field of computer science. His work at this esteemed company has allowed him to explore new frontiers in programming and software development.

Collaborations

Some of his notable coworkers include Walter David Lichtenstein and Ross A Towle. Their collaboration has likely fostered an environment of creativity and innovation, leading to advancements in their respective fields.

Conclusion

Rune Dahl's contributions to programming through his patent demonstrate his innovative spirit and dedication to improving software execution. His work at Silicon Graphics, Incorporated, alongside talented colleagues, continues to influence the tech industry positively.

Profile summary based on public USPTO records.
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