Sundsvall, Sweden

Rune A Wappling

This inventor holds 1 USPTO granted patent. Top assignee: Sca Development Aktiebolag. Active years: 1979.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rune A Wappling. Retrieved from https://idiyas.com/inventor/rune-a-wappling

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1979

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1 patent (USPTO):Explore Patents

Title: Innovations by Rune A Wappling

Introduction

Rune A Wappling is an accomplished inventor based in Sundsvall, Sweden. He has made significant contributions to the field of paper treatment technology. His innovative approach has led to the development of a unique device that enhances the quality of paper products.

Latest Patents

Wappling holds a patent for a "Paper surface treating device." This device is designed to apply a fluid surface treatment agent to a paper web. It features a container that receives the fluid treatment agent, which is then transferred to the paper web through a gap. A rotary brush, positioned opposite the gap, applies pressure to ensure effective contact between the paper web and the fluid. The brush's position and pressure are adjustable, and a casing surrounds it to create a fan effect during operation.

Career Highlights

Rune A Wappling is associated with SCA Development Aktiebolag, a company known for its focus on sustainable and innovative solutions in the paper industry. His work at SCA Development has allowed him to explore and implement advanced technologies that improve paper production processes.

Conclusion

Rune A Wappling's contributions to paper surface treatment technology exemplify the impact of innovation in the industry. His patented device showcases his commitment to enhancing product quality through inventive solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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