Tokyo, Japan

Runa Unagami

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Lion Corporation. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Runa Unagami. Retrieved from https://idiyas.com/inventor/runa-unagami

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Runa Unagami: Innovator in Electroconductive Materials

Introduction

Runa Unagami is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of electroconductive materials, particularly through her innovative patent related to polar dispersion compositions.

Latest Patents

Runa Unagami holds a patent for a polar dispersion composition of carbon black. This invention provides a polar dispersion composition containing 0.5 to 30 parts by mass of an electroconductive carbon black and 0.1 to 30 parts by mass of a styrene-methoxy polyethylene glycol methacrylate copolymer, with respect to 100 parts by mass of the polar dispersion composition. The composition is designed to be easy to handle as a liquid preparation and develops sufficient electroconductivity when processed into a conductive material. She has 1 patent to her name.

Career Highlights

Runa is currently employed at Lion Corporation, where she continues to innovate and develop new materials. Her work has been instrumental in advancing the applications of electroconductive materials in various industries.

Collaborations

Runa collaborates with notable colleagues, including Atsushi Ito and Yoshiyasu Kubo, who contribute to her research and development efforts.

Conclusion

Runa Unagami is a trailblazer in the field of electroconductive materials, with her innovative patent showcasing her expertise and dedication to advancing technology. Her contributions are paving the way for future developments in this important area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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