Shanghai, China

Rui Chang


Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2020-2021

Loading Chart...
2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Rui Chang

Introduction

Rui Chang is a notable inventor based in Shanghai, China. He has made significant contributions to the fields of storage management and magnetic technologies. With a total of 2 patents, his work reflects a commitment to enhancing technological capabilities.

Latest Patents

Rui Chang's latest patents include innovative methods and electronic devices for storage management. These techniques involve detecting when a storage device is plugged into a system and determining a target interface device that matches the storage device's attributes. This process improves compatibility and scalability by supporting at least two different types of disks within existing storage systems. Another notable patent is for an undulator that comprises multiple permanent magnet periods arranged to generate various types of polarized light when electron beams pass through. This invention allows for the creation of composite magnetic fields, enhancing the functionality of electron beam applications.

Career Highlights

Rui Chang has worked with prestigious organizations, including the Chinese Academy of Sciences and Emc IP Holding Company LLC. His experience in these institutions has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.

Collaborations

Throughout his career, Rui has collaborated with talented individuals such as Shan Qiao and Fuhao Ji. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Rui Chang's contributions to innovation in storage management and magnetic technologies highlight his role as a significant inventor. His patents not only demonstrate his technical expertise but also his commitment to advancing technology for broader applications.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…