The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10624200 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 14, 2020

Filed:

Nov. 13, 2015
Applicant:

Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, CN;

Inventors:

Shan Qiao, Shanghai, CN;

Rui Chang, Shanghai, CN;

Fuhao Ji, Shanghai, CN;

Mao Ye, Shanghai, CN;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01F 7/02 (2006.01); H05H 7/04 (2006.01); G21K 1/00 (2006.01); H05H 13/04 (2006.01);
U.S. Cl.
CPC ...
H05H 7/04 (2013.01); G21K 1/003 (2013.01); H01F 7/02 (2013.01); H01F 7/0278 (2013.01); H05H 13/04 (2013.01); H05H 2007/041 (2013.01);
Abstract

An undulator comprises at least M permanent magnet periods arranged sequentially in a transmission direction of electron beams, each of the permanent magnet periods comprises four rows of permanent magnet structures, in which each row comprises N rows of permanent magnet groups, and each row of the permanent magnet groups comprises K permanent magnet units, wherein M, N and K are natural numbers greater than or equal to 1; the four rows of the permanent magnet structures are pairwise matched, then relatively disposed on both sides of the transmission direction of electron beams, and are capable of forming at least one composite magnetic fields by relative displacement, such that elliptically polarized light, circularly polarized light, or linearly polarized light with an arbitrary polarization angle of 0°˜360° is generated when electron beams pass through the composite magnetic fields, and such that velocity directions of electrons are deviated from an axis direction of the undulator.


Find Patent Forward Citations

Loading…