Kaohsiung, Taiwan

Ruey-Sing Weng

This inventor holds 1 USPTO granted patent. Top assignee: Wintek Corporation. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ruey-Sing Weng. Retrieved from https://idiyas.com/inventor/ruey-sing-weng

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2011

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovations of Ruey-Sing Weng

Introduction

Ruey-Sing Weng is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of image processing technology. His innovative work has led to the development of a unique patent that enhances image contrast.

Latest Patents

Ruey-Sing Weng holds a patent for an "Adjusting apparatus for enhancing the contrast of image and method therefor." This invention provides an adjusting apparatus that includes a mask processor, a brightness detecting unit, a brightness adjusting unit, a ratio calculating unit, and a contrast enhancing unit. The mask processor retrieves a pixel matrix from an original image based on its mask dimension and outputs a specific pixel corresponding to a specific position in the pixel matrix. The subsequent units work in series to process the image, ultimately enhancing its contrast.

Career Highlights

Weng is currently employed at Wintek Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in advancing image processing techniques, making significant impacts in various applications.

Collaborations

Ruey-Sing Weng has collaborated with several talented individuals, including Jyun-Sian Li and Shin-Tai Lo. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Ruey-Sing Weng's contributions to image processing technology through his patent demonstrate his commitment to innovation. His work continues to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…