Rudolph Wayne Hrobsky

Title: The Innovative Contributions of Rudolph Wayne Hrobsky

Introduction

Rudolph Wayne Hrobsky is a notable inventor based in Platteville, Colorado. He has made significant contributions to the field of photoconductor technology, holding a total of 7 patents. His work focuses on enhancing the performance and durability of photoconductor drums used in various imaging devices.

Latest Patents

Hrobsky's latest patents include innovative methods for creating photoconductor drums with protective overcoats. One of his patents describes a method to make a photoconductor drum having an overcoat using a dual curing process. This method involves a two-step curing process that applies either ionizing or non-ionizing irradiation to the photoconductor drum. The first step cures the drum, while a mask is placed over the print area to expose the outermost edges for a second curing step using ultraviolet light. Another patent outlines a method for curing an overcoat in a photoconductor used in electrophotographic imaging devices, utilizing a similar dual curing process to enhance the protective layer.

Career Highlights

Hrobsky is currently employed at Lexmark International, Inc., where he continues to develop innovative solutions in imaging technology. His expertise in photoconductor technology has positioned him as a key contributor to advancements in this field.

Collaborations

Throughout his career, Hrobsky has collaborated with talented individuals such as Weimei Luo and Mark Thomas Bellino. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Rudolph Wayne Hrobsky's contributions to photoconductor technology are significant and impactful. His innovative patents and collaborative efforts continue to shape the future of imaging devices.