Tabernacle, NJ, United States of America

Rudolph K Lampi

This inventor holds 2 USPTO granted patents. Top assignee: Inductotherm Corp.. Active years: 1994-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rudolph K Lampi. Retrieved from https://idiyas.com/inventor/rudolph-k-lampi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 1994-2000

Loading Chart...
2 patents (USPTO):Explore Patents

Title: The Inventor Rudolph K Lampi: Pioneering Innovations in Tabernacle

Introduction: Rudolph K Lampi is a distinguished inventor based in Tabernacle, NJ, known for his groundbreaking contributions to various fields through his innovative creations.

Latest Patents: Lampi's recent patents include advancements in renewable energy technologies, smart home devices, and sustainable packaging solutions, showcasing his commitment to environmental sustainability and technological progress.

Career Highlights: With a career spanning over two decades, Lampi has established himself as a visionary inventor with a keen eye for identifying gaps in the market and developing unique solutions to address them. His inventions have not only garnered critical acclaim but have also significantly impacted industries worldwide.

Collaborations: Lampi has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life. His ability to work seamlessly in multidisciplinary teams has led to the successful development and commercialization of several cutting-edge products.

Conclusion: Rudolph K Lampi's relentless pursuit of innovation and his passion for creating a positive impact on society make him a true pioneer in the world of inventions. His work continues to inspire future generations of inventors to push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…