Laupheim, Germany

Rudolf Scheffold

This inventor holds 1 USPTO granted patent. Top assignee: Josef Uhlmann Maschinenfabrik Gbmh & Co. Kg. Active years: 1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rudolf Scheffold. Retrieved from https://idiyas.com/inventor/rudolf-scheffold

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Rudolf Scheffold: Innovator in Foil Strip Technology

Introduction

Rudolf Scheffold is a notable inventor based in Laupheim, Germany. He has made significant contributions to the field of machinery, particularly in the area of foil strip technology. His innovative approach has led to the development of a unique method and device that enhances the length rectification of foil strips.

Latest Patents

Rudolf Scheffold holds 1 patent for his invention titled "Method and device for the length rectification of a foil strip." This patent showcases his expertise and commitment to advancing technology in his field.

Career Highlights

Scheffold is associated with Josef Uhlmann Maschinenfabrik GmbH & Co. KG, a company renowned for its innovative machinery solutions. His work at this esteemed organization has allowed him to apply his inventive skills in practical applications, contributing to the company's reputation for excellence.

Collaborations

Throughout his career, Rudolf has collaborated with talented individuals such as Herbert Rittinger and Dieter Janek. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Rudolf Scheffold's contributions to the field of machinery, particularly in foil strip technology, highlight his role as an influential inventor. His patent and collaborations reflect his dedication to innovation and excellence in his work.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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