New York, NY, United States of America

Rudolf G Hutter

This inventor holds 1 USPTO granted patent. Top assignee: Gte Laboratories Incorporated. Active years: 1976.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 1976

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1 patent (USPTO):Explore Patents

Title: Rudolf G Hutter: Innovator in Electron Gun Technology

Introduction

Rudolf G Hutter is a notable inventor based in New York, NY (US). He has made significant contributions to the field of electron gun technology, particularly through his innovative patent. His work has implications for various applications, including cathode-ray tubes.

Latest Patents

Hutter holds a patent for a "Double grid electron gun system and method of use." This invention features an electron gun designed for use in a cathode-ray tube, which includes two control grids positioned between the cathode and an accelerating electrode. Each control grid is equipped with separate control voltages that carry the same intensity-modulation information to regulate the electron beam emitted from the cathode. The unique aspect of this design is that the two control voltages are varied in a manner where one follows a linear function of the other. This configuration allows the area of the cathode that emits the electron beam to remain relatively constant across a wide range of control voltages.

Career Highlights

Hutter is associated with GTE Laboratories Incorporated, where he has contributed to advancements in electronic technologies. His work has been instrumental in enhancing the performance and efficiency of electron guns used in various devices.

Collaborations

Hutter has worked alongside his coworker, Herman O Dressel, contributing to the innovative environment at GTE Laboratories Incorporated.

Conclusion

Rudolf G Hutter's contributions to electron gun technology exemplify the impact of innovative thinking in the field of electronics. His patent for the double grid electron gun system showcases his ability to solve complex engineering challenges.

Profile summary based on public USPTO records.
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