Sunriver, OR, United States of America

Rudolf E Svadlenak


Average Co-Inventor Count = 2.8

ph-index = 3

Forward Citations = 27(Granted Patents)


Location History:

  • Hockessin, DE (US) (1990)
  • Sunriver, OR (US) (1993)

Company Filing History:


Years Active: 1990-1993

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Rudolf E. Svadlenak: Innovator in Aqueous Cleaning Systems

Introduction

Rudolf E. Svadlenak is a notable inventor based in Sunriver, Oregon. He has made significant contributions to the field of cleaning compositions, particularly focusing on non-halogenated aqueous systems. With a total of 4 patents to his name, Svadlenak's work has had a meaningful impact on industrial cleaning processes.

Latest Patents

Svadlenak's latest patents include innovative solutions for cleaning and degreasing. One of his notable inventions is a non-halogenated aqueous degreasing composition, which is effective for removing inks and cleaning printed circuit boards. This composition consists of a three-component mixture that includes an organic acid, a straight chain alkanol or alkyl ester, and water. Another significant patent is for a process that isolates alkyl glyoxylate from a gaseous reaction mixture. This process involves using a hot solvent that selectively dissolves alkyl glycolate and alkyl glyoxylate, allowing for efficient separation through distillation.

Career Highlights

Rudolf E. Svadlenak is currently associated with E.I. DuPont de Nemours and Company, where he continues to innovate in the field of cleaning technologies. His work has been instrumental in developing environmentally friendly cleaning solutions that meet industry standards.

Collaborations

Svadlenak has collaborated with esteemed colleagues such as George E. Heinsohn and Earnest W. Porta. These collaborations have further enhanced the quality and applicability of his inventions.

Conclusion

Rudolf E. Svadlenak's contributions to the field of aqueous cleaning systems demonstrate his commitment to innovation and environmental sustainability. His patents reflect a deep understanding of chemistry and practical applications in industrial cleaning.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…