Shanghai, China

Rucuo Wei

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: Wuhan Tianma Micro-Electronics Co., Ltd, Wuhan Tianma Microelectronics Co., Ltd. Shanghai Branch. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rucuo Wei. Retrieved from https://idiyas.com/inventor/rucuo-wei-39csx1nk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Rucuo Wei: Innovator in Display Technology

Introduction

Rucuo Wei is a notable inventor based in Shanghai, China. He has made significant contributions to the field of display technology, particularly through his innovative patent.

Latest Patents

Rucuo Wei holds a patent for a display panel and electronic device. This invention includes a substrate with a display area and a frame area surrounding it. The display panel features a plurality of sub-pixels located in the display area, along with several pins and alignment marks in the frame area. Notably, one of the alignment marks is a photosensitive element connected to a pin, enhancing the functionality of the display.

Career Highlights

Throughout his career, Rucuo Wei has worked with prominent companies in the electronics sector. He has been associated with Wuhan Tianma Micro-electronics Co., Ltd and its Shanghai branch. His work in these organizations has contributed to advancements in display technologies.

Collaborations

Rucuo Wei has collaborated with several professionals in his field, including Lei Suo and Cheng Tang. These partnerships have likely fostered innovation and development in his projects.

Conclusion

Rucuo Wei's contributions to display technology through his patent and career in leading companies highlight his role as an influential inventor. His work continues to impact the electronics industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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