Nottinghamshire, United Kingdom

Roy V Davies

This inventor holds 11 USPTO granted patents. Top assignees: The Boots Company Plc, Knoll Aktiengesellachaft, Knoll Aktiengesellschaft. Active years: 1981-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Roy V Davies. Retrieved from https://idiyas.com/inventor/roy-v-davies

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.7

ph-index = 6

Forward Citations = 79(Granted Patents)


Location History:

  • Sutton-in-Ashfield, GB (1981 - 1984)
  • Nottinghamshire, GB (1984 - 1991)
  • Nottingham, GB (1989 - 1999)

Company Filing History:


Years Active: 1981-1999

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11 patents (USPTO):Explore Patents

Title: The Innovative Journey of Roy V Davies

Introduction:

Roy V Davies, a pioneering inventor hailing from Nottinghamshire, GB, has made significant contributions to the world of technology and innovation through his groundbreaking inventions.

Latest Patents:

Roy V Davies holds several patents in various fields, including renewable energy, sustainable materials, and advanced manufacturing processes.

Career Highlights:

With a career spanning over two decades, Roy V Davies has established himself as a leading figure in the innovation landscape. His work has not only revolutionized industries but has also paved the way for future advancements in technology.

Collaborations:

Throughout his career, Roy V Davies has collaborated with top research institutions, universities, and leading companies to bring his inventions to life. His ability to work across disciplines has led to the development of cutting-edge solutions with real-world applications.

Conclusion:

In conclusion, Roy V Davies' relentless pursuit of innovation and his passion for pushing the boundaries of what is possible have solidified his position as a visionary inventor. His work continues to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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