North Webster, IN, United States of America

Roy C Wiley

This inventor holds 2 USPTO granted patents, plus 2 CIPO patents. Top assignee: Pace Surgical, Inc.. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Roy C Wiley. Retrieved from https://idiyas.com/inventor/roy-c-wiley-0xc4kjuv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Roy C. Wiley: Innovator in Orthopaedic Implant Systems

Introduction

Roy C. Wiley is a notable inventor based in North Webster, Indiana. He has made significant contributions to the field of orthopaedics through his innovative designs and patents. His work focuses on improving joint functionality and patient outcomes.

Latest Patents

Roy C. Wiley holds a patent for an "Orthopaedic implant system for compression-distraction of joints." This system includes an orthopaedic implant featuring multiple fixation openings and a plug opening. The design allows for effective compression distraction between two bones, enhancing joint stability and function.

Career Highlights

Wiley is associated with Pace Surgical, Inc., where he applies his expertise in orthopaedic technology. His dedication to advancing medical devices has positioned him as a key player in the industry. With a focus on patient care, his innovations aim to improve surgical outcomes.

Collaborations

Throughout his career, Roy has collaborated with esteemed professionals in the field, including Lew C. Schon and Malik S. Siddique. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Roy C. Wiley's contributions to orthopaedic implant systems exemplify his commitment to enhancing medical technology. His innovative spirit and collaborative efforts continue to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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