Hong Kong, China

Ross David Murch

This inventor holds 25 USPTO granted patents and 2 published patent applications and 1 EPO patent, primarily in Antenna Technology. Top assignees: The Hong Kong University of Science and Technology, Hong Kong Applied Science and Technology Research Institute, Tuen Solutions Limited Liability Company. Active years: 1998-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ross David Murch. Retrieved from https://idiyas.com/inventor/ross-david-murch

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 25 

% Patents Active = 80.0

 

Average Co-Inventor Count = 3.2

ph-index = 14

Forward Citations = 906(Granted Patents)


Location History:

  • Kouloon, CN (2009)
  • Kowloon, CN (2009)
  • Hong Kong, CN (1998 - 2023)

Company Filing History:


Years Active: 1998-2026

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Areas of Expertise:
Reconfigurable Antenna
Beam-Steerable Antenna
Wideband Antenna
MIMO Systems
Wireless Communications
Power Resource Management
Mobile Devices
RFID Tag
Multi-Port Antenna
Data Rate Maximization
Channel Sensing
Device Isolation
25 patents (USPTO):Explore Patents

Title: Ross David Murch - Pioneering Inventor from Hong Kong

Introduction: Ross David Murch is a distinguished inventor based in Hong Kong, China, known for his groundbreaking contributions to various industries.

Latest Patents: Ross David Murch holds several patents in the fields of technology, healthcare, and sustainable energy, showcasing his versatility and innovative spirit.

Career Highlights: With a career spanning over two decades, Ross David Murch has consistently pushed the boundaries of innovation, leading to the development of cutting-edge solutions that have revolutionized the way we live and work.

Collaborations: Throughout his career, Ross David Murch has collaborated with leading research institutions, universities, and companies worldwide, fostering a culture of innovation and knowledge exchange.

Conclusion: Ross David Murch's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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