San Jose, CA, United States of America

Roshni Biswas

USPTO Granted Patents = 5 

Average Co-Inventor Count = 5.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2021-2024

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5 patents (USPTO):

Sure, here is the article about inventor Roshni Biswas:

Title: Innovator Spotlight: Roshni Biswas - Leading the Way in Patterning Device Technology

Introduction:

Roshni Biswas, a talented inventor based in San Jose, CA, is making waves in the field of patterning device technology. With a total of 5 patents to his name, his groundbreaking work is revolutionizing the way we approach manufacturability and scattering of radiation by structures on patterning devices.

Latest Patents:

1. Method for determining patterning device pattern based on manufacturability: This patent introduces a method that optimizes patterning device patterns based on desired feature sizes, ultimately enhancing manufacturability and reducing differences between predicted and target patterns on substrates.

2. Methods of determining scattering of radiation by structures of finite thicknesses on a patterning device: This patent focuses on determining scattering effects by structures on patterning devices, utilizing thin-mask transmission functions and M3D models to improve aerial image production during lithographic processes.

Career Highlights:

Roshni Biswas is currently affiliated with ASML Netherlands B.V., a prominent technology company at the forefront of innovation in lithography systems. His role at ASML showcases his expertise in advancing patterning device technologies and pushing the boundaries of what is achievable in the industry.

Collaborations:

Throughout his career, Roshni has collaborated with esteemed professionals in the field, including Rafael C. Howell and Yu Long Cao. Together, they have worked on cutting-edge projects that have contributed significantly to the advancements in patterning device technology.

Conclusion:

In conclusion, Roshni Biswas is a trailblazing inventor who continues to drive innovation in patterning device technology. His relentless pursuit of excellence and commitment to pushing the boundaries of what is possible make him a valuable asset to the industry. We look forward to seeing his future inventions shape the landscape of technology even further.

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