This inventor holds 1 USPTO granted patent. Top assignee: Advanced Technology Materials, Inc.. Active years: 2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004
Title: Ronni M Etterman: Innovator in Electrochemical Deposition
Introduction
Ronni M Etterman is a notable inventor based in Portland, OR (US). She has made significant contributions to the field of electrochemical deposition, particularly in the area of metal plating solutions. Her innovative approach has led to the development of a unique method that enhances the efficiency of metal electroplating processes.
Latest Patents
Ronni M Etterman holds a patent for a method titled "Method for determining concentrations of additives in acid copper electrochemical deposition baths." This invention focuses on determining the concentration of brighteners and levelers in aqueous acid metal electroplating solutions. The method involves measuring the concentration of brighteners under specific conditions and then measuring the levelers under different conditions, ensuring that the parameters for each measurement differ in terms of rotation speed and electroplating duration.
Career Highlights
Ronni is currently associated with Advanced Technology Materials, Inc., where she applies her expertise in electrochemical processes. Her work has been instrumental in advancing the understanding and application of metal deposition techniques. With her innovative mindset, she continues to push the boundaries of what is possible in her field.
Collaborations
Throughout her career, Ronni has collaborated with esteemed colleagues, including Jianwen Han and Peter M Robertson. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Ronni M Etterman is a pioneering inventor whose work in electrochemical deposition has made a lasting impact on the industry. Her patented method for determining concentrations of additives in plating solutions exemplifies her commitment to innovation and excellence.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile