This inventor holds 3 USPTO granted patents and 1 EPO patent. Top assignees: Vivachek Biotech (Hangzhou) Co., Ltd., Other. Active years: 2007-2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2007-2020
Title: Innovations by Rong Yang
Introduction
Rong Yang is an accomplished inventor based in Hangzhou, China. He has made significant contributions to the field of technology, particularly in the development of resistance structures and biosensors. With a total of 3 patents to his name, his work showcases a blend of creativity and technical expertise.
Latest Patents
Rong Yang's latest patents include a resistance structure, a resistance structure unit, an information identification device, and a biosensor. The resistance structure comprises a first electrode, a second electrode, and a plurality of first resistance elements. Each first resistance element connects one end to the first electrode and the other end to the second electrode. Additionally, a first fracture divides the first electrode into two parts, strategically located between adjacent first resistance elements. A third electrode is also included, which connects to one part of the first electrode, enhancing the functionality of the device.
Career Highlights
Throughout his career, Rong Yang has worked with notable companies, including Vivachek Biotech (Hangzhou) Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects in the technology sector.
Collaborations
Rong Yang has collaborated with talented individuals such as Qinggang Yang and Huiyan Guo. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Rong Yang's contributions to the field of technology through his patents and collaborations highlight his innovative spirit and dedication to advancing scientific knowledge. His work continues to influence the development of new technologies and applications in various industries.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile