Company Filing History:
Years Active: 2015
Title: Innovations of Rong-Jhe Lyu in Thin-Film Transistor Technology
Introduction
Rong-Jhe Lyu is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of thin-film transistors. His innovative methods have the potential to enhance the performance and efficiency of electronic devices.
Latest Patents
Rong-Jhe Lyu holds a patent for a method of fabricating a thin-film transistor. This method involves forming a patterned dielectric mask structure with a gate dielectric layer that covers the gate of a gate-stacked structure. The top surface of the mask has at least two openings, allowing a semiconductor layer to be formed via sputtering. This semiconductor layer includes a channel above the gate, with a source and drain positioned below the openings. Notably, the channel's thickness decreases from the edges to the center, which is a key aspect of his invention.
Career Highlights
Rong-Jhe Lyu is affiliated with National Yang Ming Chiao Tung University, where he continues to engage in research and development in semiconductor technologies. His work has garnered attention for its innovative approach to improving thin-film transistors, which are crucial components in modern electronics.
Collaborations
Rong-Jhe Lyu collaborates with Horng-Chih Lin, contributing to advancements in their field through shared expertise and research efforts.
Conclusion
Rong-Jhe Lyu's contributions to thin-film transistor technology exemplify the importance of innovation in the semiconductor industry. His patented methods are paving the way for future advancements in electronic devices.