Clearwater, FL, United States of America

Ronald W Shovan

This inventor holds 2 USPTO granted patents. Top assignee: Honeywell G.m.b.h.. Active years: 1987-1999.


% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 1987-1999

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2 patents (USPTO):Explore Patents

Title: The Innovations of Ronald W. Shovan

Introduction

Ronald W. Shovan is a notable inventor based in Clearwater, FL (US). He has made significant contributions to the field of technology, particularly in radiation-hardened materials and circuits. With a total of 2 patents, his work has had a profound impact on various applications in radiation environments.

Latest Patents

One of Ronald's latest patents is titled "Very Low Expansion Radiation Hardened Transmission Medium." This invention features an output mirror with a substrate that is doped with a radiation stabilizing material. It is designed to reduce the adverse effects of prolonged exposure to radiation, maintaining its transmissive characteristics even in challenging environments. Another significant patent is the "Radiation Hard Visible Light Readout Circuit." This invention utilizes a pair of photodetectors connected in series, where one is masked to block visible light while allowing a response to non-visible radiation such as gamma rays and x-rays.

Career Highlights

Ronald W. Shovan is currently employed at Honeywell GmbH, where he continues to innovate and develop advanced technologies. His work at Honeywell has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of Ronald's coworkers include Allan P. Johnson and Steven C. Albers. Their collective expertise contributes to the innovative environment at Honeywell.

Conclusion

Ronald W. Shovan's contributions to technology through his patents and work at Honeywell highlight his role as a significant inventor in the field. His innovations in radiation-hardened materials and circuits continue to influence advancements in various applications.

Profile summary based on public USPTO records.
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