Company Filing History:
3 out of 299 
1 out of 832,966 Years Active: 2002-2005
Title: The Innovations of Ronald M Huppe
Introduction
Ronald M Huppe is a notable inventor based in Windsor, Vermont, known for his contributions to the field of plasma arc systems. With a total of 4 patents to his name, Huppe has made significant advancements in the technology that underpins these systems.
Latest Patents
One of Huppe's latest patents is titled "Centralized control architecture for a plasma arc system." This invention features a centralized control architecture for a closely-coupled plasma arc system, where the 'intelligence' of the system is integrated into a single controller. The closely-coupled plasma arc system includes a power source, an automatic process controller, and a torch-height controller, with each component having a closed-loop dynamic relationship with the controller.
Career Highlights
Throughout his career, Huppe has worked with various companies, including Hypertherm, Inc. His work has focused on enhancing the efficiency and effectiveness of plasma arc systems, contributing to advancements in industrial applications.
Collaborations
Huppe has collaborated with notable individuals in his field, including Tate S Picard and Roger E Young, Jr. These collaborations have likely enriched his work and led to innovative solutions in plasma technology.
Conclusion
Ronald M Huppe's contributions to the field of plasma arc systems through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively.