The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 19, 2002

Filed:

Apr. 10, 2000
Applicant:
Inventors:

Tate S. Picard, Enfield, NH (US);

Roger E. Young, Jr., Canaan, NH (US);

Gregory S. Wilson, Newbury, NH (US);

Ronald M. Huppe, Jr., Windsor, VT (US);

Assignee:

Hypertherm, Inc., Hanover, NH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 1/000 ;
U.S. Cl.
CPC ...
B23K 1/000 ;
Abstract

The invention features a centralized control architecture for a closely-coupled plasma arc system, in which the “intelligence” of the system is integrated into a single controller. The closely-coupled plasma arc system includes a power source, an automatic process controller and a torch-height controller, where each of these components individually has a closed-loop dynamic relationship with the controller.


Find Patent Forward Citations

Picard, Tate. (2002). Centralized control architecture for a plasma arc system (U.S. Patent No. 6359251). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6359251

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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