Lisle, IL, United States of America

Ronald Llanes

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Chicago Steel Tape. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ronald Llanes. Retrieved from https://idiyas.com/inventor/ronald-llanes

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Ronald Llanes

Introduction

Ronald Llanes, an inventive force located in Lisle, IL, has made significant strides in the field of technology. With a focus on innovation and problem-solving, he has contributed to advancements in laser technology.

Latest Patents

Ronald holds a patent for the "Multipoint Self-Leveling Laser," which showcases his creativity and technical expertise. This invention is designed to enhance precision in various applications, making it a valuable asset in construction and engineering.

Career Highlights

Currently working at Chicago Steel Tape, Ronald has established himself as a key player in the development of innovative products. His commitment to excellence and continual improvement has set him apart in a competitive field.

Collaborations

Ronald collaborates closely with his coworkers, including Ash Puri and Bill Huff. Together, they foster a collaborative environment that encourages creativity and fuels the development of groundbreaking technologies.

Conclusion

In conclusion, Ronald Llanes is a dedicated inventor whose work in developing the Multipoint Self-Leveling Laser exemplifies his commitment to innovation. His contributions to Chicago Steel Tape and his collaborations with talented colleagues underscore the importance of teamwork in achieving remarkable advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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